The Hybrid 3D optical profilometer Superview WT series is used for sub nanometer measurement of surfaces of various precision components and materials. It integrates the performance characteristics of two high-precision 3D measuring instruments, white light interferometer and confocal microscope, and can perform non-contact scanning of the samples surface then re-establish 3D surface image. When measuring the ultra smooth and transparent surfaces, white light interferometry mode can be used to obtain high-precision and distortion-free images, and analyze parameters such as roughness. When measuring coarse surfaces with sharp angle features, confocal microscopy mode can reconstruct large angle 3D topography images, and 2D & 3D parameters reflecting surface quality are obtained by data processing and analysis of surface 3D images through software.
Parameters
Adding W-Ultra high-speed scanning module can increase scanning speed by several times.
| Model No. | SuperView WT3000 | SuperView WT3200 | |
| Light Source | White Light LED | ||
| Video System | 1024×1024 | ||
| Interference Objective Lens | 10X (2.5X, 5X, 20X, 100X optional) | ||
| Confocal Objective Lenses | 10X, 50X(5X, 20X, 100X optional) | ||
| Standard Field of View | 1.2×1.2mm (10x) | ||
| Lens Turret | Motorized 5-hole turret | ||
| XY Object Table | Size | 200×200mm | 300×300mm |
| Travel Range | 100×100mm | 200×200mm | |
| Load Capacity | 10kg | ||
| Control Mode | Motorized | ||
| Tilt | ±3° | ||
| Z – axis | Travel Range | 100mm | |
| Control Mode | Motorized | ||
| Z Stroke Scanning Range | 10mm | ||
| Surface Topography Repeatability STR*1 | 0.1nm (White light interferometry) | ||
| Roughness RMS Repeatability*2 | 0.005nm (White light interferometry) | ||
| Step Height Measurement*3 | Accuracy: 0.5%; Repeatability: 0.1% (1σ) (White light interferometry) | ||
| Weight | 50kg | ||
| Size (L x W x H) | 440×330×700mm | 600×700×850mm | |
| Operating Environment | Temperature | 0°C – 30°C, Variation <2°C / hour | |
| Humidity | 5% – 95% RH, no condensation | ||
| Vibration | VC-C or better | ||
| Software Noise Evaluation*4 | 3σ≤4nm | ||
| Compressed Air | 0.6Mpa oil-free and water-free, 6mm diameter of hose | ||
| Power Supply | AC100 – 240V, 50/60Hz, 4A, Power 300W | ||
| Others | No strong magnetic field, no corrosive gas | ||
Note:
*1 Use EPSI mode to measure Sa 0.2nm silicon wafer in the laboratory environment, Single stripe, 80um filter for full field of view
*2 Measure Sa 0.2nm silicon wafer in a laboratory environment according to the ISO 25178
*3 Measure standard 5um steps height block in a laboratory environmer.int according to the ISO 10610-1:2009
*4 When the software noise evaluation is 4nm≤3σ≤10nm, the Rouglhness RMS repeatability is revised down to 0.015nm, the Step height measurement accuracy is revised down to 0.7%, and thhe step height measurement repeatability is revised down to 0.12%;
